Fabrication Services

MEMS FABRICATION UNDER CLEANROOM CONDITIONS

microfab is service provider in the field of silicon-based micro-systems technology. Our production lines, located in two cleanrooms, feature state-of-the-art facilities that permit wafers of 100 to 150mm to be processed. We can provide standard MEMS production technologies like surface micromachining, bulk micromachining, silicon deep etching (DRIE, Bosch process), wafer bonding as well as 3D microforming.

Please follow the links below to find out more about the individual manufacturing options at microfab.

Thin film deposition techniques are used to deposit a wide variety of materials on the wafer surface

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Quartz furnace processes under inert gas (N2) atmosphere

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microfab’s Photolithography department is located in a class ISO 4 clean room cell

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Wet chemical etching is commonly used for uniform stripping or patterning through a mask

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Dry etching techniques (RIE, ion beam and plasma etching) are intensively used at microfab

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DRIE is a high aspect ratio, deep trench silicon etching process

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microfab is able to do direct, face-to-face bonding of silicon and glass wafers

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For prototyping and small series production microfab offers Back end services

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